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Intel bets new device debuting in Hillsboro will cement company’s place as industry leader

Intel has completed assembly of the massive device — called a high numerical aperture extreme ultraviolet lithography scanner, High NA EUV for short — at its Hillsboro campus, the chipmaker announced ... read more

Gov. Kotek to pursue plans for building federal technical center at Intel's Hillsboro site

PORTLAND, Oregon — Oregon Gov. Tina Kotek wants to strengthen Oregon's semiconductor industry. She plans to propose forming a new technical center at Intel's Hillsboro site. She made the announcement ... read more

Intel Completes Assembly of World's First High-NA Lithography Machine

Intel has been in the news lately for being the first semiconductor fab to jump aboard the high numerical aperture (high-NA) fabrication train. The company is the first of the big fabs to buy a ... read more

Intel completes assembly of world’s most advanced EUV lithography system

Intel Corp.’s newly formed chip foundry business said today it has achieved a crucial milestone for the chipmaking industry by completing the assembly of the world’s first commercial High Numerical ... read more

Intel foundry opens new frontier in chip making

Intel expects to use both 0.33NA EUV and 0.55NA EUV alongside other lithography processes in developing and manufacturing advanced chips, starting with product proof points on Intel 18A in 2025 and ... read more

Intel Foundry completes assembly of ASML High-NA EUV tools

Intel recently announced that its foundry operations, Intel Foundry, achieved a significant milestone in advanced semiconductor manufacturing by completing the assembly of the industry's first ... read more

3D printed multilayer structures for high-numerical aperture achromatic lenses

Materials scientists have recently attempted to achieve achromatic lenses to uncover a tradeoff between the numerical aperture and bandwidth that limits the performance of such materials. read more

Intel opens its Oregon doors to promote one-of-a-kind chipmaking tool

The company invited a half-dozen media outlets, including the Business Journal, inside its Hillsboro facilities last week to show off the first commercially deployed high-NA EUV system. read more

Intel completes assembly of first commercial High-NA EUV chipmaking tool — addresses cost concerns, preps for 14A process development in 2025

Intel Foundry announced it had completed the assembly of the industry's first commercial High Numerical Aperture (High-NA) Extreme Ultraviolet (EUV) machine in its D1X fab in Oregon. read more

Undisclosed foundry is the second buyer of ASML's $400 million second-gen EUV machine

With a higher-resolution pattern transferred to a wafer, a foundry might not have to run a wafer through the EUV a second time to print the details needed which saves the foundry both time and money. read more

Intel completes assembly of High NA EUV lithography tool at Oregon fab

Intel has completed the assembly of its High Numerical Aperture NA Extreme Ultraviolet (High NA EUV) lithography tool at the company’s R&D site in Hillsboro, Oregon. Built by ASML and delivered in ... read more

Intel bets its future on exotic, expensive tool that shoots lasers hotter than the sun

From there, the EUV — extreme ultraviolet — tool shoots lasers at miniscule droplets of tin, firing 50,000 times a second with a burst of energy 40 times hotter than the surface of the sun. The ... read more
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